J. Ahopelto, VTT Technical Research Centre of Finland, Espoo, FINLAND

  C. Airoldi, University Estadual Campinas, BRAZIL

  D. Altbir, University of Santiago, CHILE

  Ch. Andraud, ENS Lyon, FRANCE

  M. I. Aranguren, National University Mar del Plata, ARGENTINA

  K. Arof, Technological University, MALAYSIA

  R. Arratia, University Andres Bello, Santiago, CHILE

  A. Asenjo, University of Chile, CHILE

  A.J. Attias, P.&M. Curie University of Paris, FRANCE

  C. Barbero, University of Rio Cuarto, ARGENTINA

  G. Bidan, CEA-DSM, Grenoble, FRANCE

  W. Blau, Trinity College Dublin, IRELAND

  L. Blum, Université Lyon 1, FRANCE

  H.G. Braun , Leibniz-Institute of Polymer Research, Dresden, GERMANY

  G. Burillo, Univ. Nacional Autónoma de México, MEXICO

  C. Chevrot,  Université de Cergy-Pontoise, FRANCE

  A Craievich Universidade de São Paulo, BRAZIL

  C.B. De Araujo, Univ. Federal de Pernambuco, BRAZIL

  F. Del Monte, CSIC, ICMM, Madrid, SPAIN

  I. Demetrescu, Politehnica University of Bucharest, ROMANIA

  J. Denardin, University Santiago de Chile, Chile

  D. Djurado, CEA Grenoble, FRANCE

  J. P. Donoso, University of Sao Paulo, Institute of Physics of Sao Carlos, BRAZIL

  E. Dujardin, CEMES CNRS, Toulouse, France

  D. Durand, Université du Maine, Le Mans, FRANCE

  J. Ekstedt, Ecobuild, Stockholm, SWEDEN

  S. Ermer, Lockheed Martin Space Systems Co., Palo Alto, CA. USA

  R.M. Faria, University of Sao Paulo, Institute of Physics of Sao Carlos, BRAZIL

  A. Fazzio, Universidade de São Paulo, Sao Paulo, Brazil

  W.W. Focke, University of Pretoria, Pretoria, SOUTH AFRICA

  A. Fort, IPCMS-GONLO, CNRS UMR, Strasbourg, France

  V. D. Fuenzalida, University of Chile, CHILE

  W. Gacitua, University del Bío-Bío, Concepción, CHILE

  A.S.L. Gomes, Universidade Federal of Pernambuco, Recife, BRAZIL

  G. Gonzalez, IVIC, Caracas, VENEZUELA

  P. Green, University of Michigan, USA

  P. Haberle, University Federico Santa María, Valparaíso, CHILE

  T. He. Changchun Institute of Aplied Chemistry, CHINA

  Ch. Innocent, Institut Européen des Membranes,  Montpellier, FRANCE

  F. Kajzar, Angers University, FRANCE

  V. Kazukauskas, Vilnius University, LITHUANIA

   I. C. Khoo, Pennsylvania State  University, University Park, PA, USA

  J.-J. Kim, Seoul National University, KOREA

  J.T. Koberstein, Columbia University, USA

  M. Kogan, University of Chile, Santiago, CHILE

  Y. Koike, Keio University, JAPAN

  R. Kozlowski, Institute of Natural Fibers, Poznan, POLAND

  M.G. Kuzyk, Washington University, Pullman, WA, USA

  V. Lavayen, University Federico Santa María, Valparaíso, CHILE

  A.L. Leao, Sao Paulo State University,   BRAZIL

  E.H. Lee, Inha University, Incheon, KOREA 

  K.S. Lee, Hannam University, KOREA

  S. Lefrant, Nantes University, FRANCE

  J. Lizoni, University of Chile, CHILE

  J. Llanos, Universidad Católica del Norte, Antofagasta, CHILE

  B. Loeb, P. Universidad Católica. Santiago, CHILE

  C. Magon, University Sao Paulo, Institute of Physics San Carlos, BRAZIL

  M. Mah, AFOSR, Arlington, USA

  N. Marcovich, Univ. Nacional Mar del Plata, ARGENTINA

  A. Mitus, Wroclaw Technical University, POLAND

   I. Moreno-Villoslada, University Austral de Chile, Valdivia, CHILE

  A.J. Motheo, University Sao Paulo, Institute of Chemistry San Carlos, BRAZIL

  H. Nakanishi, Tohoku University, Sendai, JAPAN

  I.L. Nantes, University Mogi das Cruzes, SP, BRAZIL

  S. Nespurek, Institute of Macromolecular Chemistry, Prague, CZECH REPUBLIC

  K. Nielsch, Max Planck Institute of Microstructure Physics, Halle, GERMANY

  T. Ogawa, , Univ. Nacional Autónoma de México, MEXICO

  O. Oliveira, University of Sao Paulo, Institute of Physics of Sao Carlos, BRAZIL

  O.O. Park, Dept. Chem. & Biomolecular Eng., KAIST, KOREA

  A. Pawlicka, University of Sao Paulo, Institute of Chemistry of Sao Carlos, BRAZIL

  J. Pielichowski, Cracow Technical University, POLAND

  M.A. Pimenta, University Federal of Minas Gerais, Belo Horizonte, BRAZIL

  D. Radic, P. Universidad Católica de Chile, Santiago, Chile

  I. Rau, Politehnica University of Bucharest, ROMANIA

  B. Rivas, University of Concepción, Concepción, CHILE

  M. Samoc , Wroclaw University of Technology, Wroclaw, Poland

  U. Simon, RWTH Aachen University, GERMANY

  E. Soto, University of Chile, Santiago, Chile  

  O.Sugihara, Tohoku University, Sendai, JAPAN

  A. Sulkowska, University of Silesia, Katowice, POLAND

  W. Sulkowski, University of Silesia, Katowice, POLAND

  J. Sworakowski, Wroclaw University of Technology, POLAND

  H. Tada, Osaka University, JAPAN

  J. Ulanski, Lodz Technical University, Poland

  J.R. Vega, Universidad Nacional in Heredia, COSTA RICA

  M. Villar, INTEMA, University Nacional Mar del Plata, ARGENTINA

  H. Von Seggern, University of Darmstadt, GERMANY

  D. Wagner, Weizmann Institute, ISRAEL

  J. Warczewski,University of Silesia, Katowice, POLAND

  R. Williams, Univ. Mar del Plata, ARGENTINA

  A. Wojcik; Hybrid Glass Technology, Princeton, USA

  S. H. Yuk, Hannam University, KOREA 

  J. Zagal, University of Santiago, CHILE

  M. Zaharescu, Romanian Academy of Sciences, ROMANIA

  F. Zuloaga, Universidad del Valle, COLOMBIA

  R. Zysler, Atomic Center Bariloche, ARGENTINA